Used E+H METROLOGY MX 2012-RA-1L #9311190 for sale

E+H METROLOGY MX 2012-RA-1L
ID: 9311190
Wafer Size: 12"
Wafer measurement system, 12".
The E+H METROLOGY E+H METROLOGY MX 2012-RA-1L is an advanced wafer testing and metrology equipment. It enables manual or automated measurements of wafer substrates for semiconductor manufacturers, ensuring critical sizes and position tolerances are met. The system features an automated calibration stage for accurate and consistent calibration and measurement performance. The unit also features a MEI-CMOS (Micropattern and Electrical Inspection) machine for non-destructive testing, which ensures a high signal-to-noise ratio for any measurement range. This allows for results that are comparable between each measurement and is extremely precise. The tool can measure a wide range of wafers, from industrial IGZO wafers to microelectromechanical asset (MEMS) wafers. Measurements include critical dimensions, thin film measurements, overlay measurements, macro defect measurements, and electrical resistance testing. In addition, the model features a high accuracy, precision scanning electron microscope (SEM) which gives the ability to identify and accurately measure a wide range of defects. The SEM also has a high magnification of up to 50,000x in order to detect very small defects. For large substrates such as wafers or other semiconductor based substrates, the equipment can also perform profile measurements using a spinning disc polisher. This allows high precision and accuracy for measurement and analysis of large surfaces. In addition to the various measurements, the system also offers analysis and reporting capabilities. It can create highly detailed reports that include all the necessary data for traceability and traceability analysis for auditing purposes. The unit also features various data management features, such as the ability to store data on removable media, and to remotely transfer data from the machine to an external computer, or transfer data to and from the internet. Overall, the E+H METROLOGY MX 2012-RA-1L is an advanced, highly accurate wafer testing and metrology tool. It has a wide range of features that enable accurate measurements, as well as providing data management and reporting capabilities for auditing purposes. This asset is an essential tool for semiconductor manufacturing and testing.
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