Used E+H METROLOGY MX 203-6-33 #9360725 for sale

ID: 9360725
Wafer Size: 4"-6"
Vintage: 2008
Wafer measurement system, 4"-6" Power supply: 240 VAC 2008 vintage.
The E+H METROLOGY E+H METROLOGY MX 203-6-33 is a powerful and reliable wafer testing and metrology equipment. It is designed to provide high-precision measurements and analysis in both semiconductor and specialty process applications. The system features a six-axis robotized stage that is capable of rapid and precise movement within a range of 1200 µm. The robot enables scanning and imaging of a wafer within minutes. It uses a closed-loop servo unit to maintain its position during scans, and is capable of repeatable multi-die scans. MX 203-6-33 also features a high-resolution digital imaging machine. The imaging tool is capable of capturing images of each die with up to 15 megapixels of resolution. The digital imaging asset also provides powerful tools for image analysis. These include contrast and edge detection, pixel intensity analysis, shape recognition, and pattern recognition. In addition to imaging, E+H METROLOGY MX 203-6-33 can perform a variety of wafer characterization measurements. These include electrical parameters such as resistivity, capacitance, and leakage, as well as physical parameters such as surface profilometry and inspection. The model is able to measure even small defects on the wafer's surface, down to 1 micron in size. MX 203-6-33 also offers a software suite to control the equipment behavior and analyze the measurement results. Several advanced features are included, such as multi-site memory, remote control, and trend analysis. The system's user-friendly interface makes it easy to set up measurements and view the results, making it an ideal choice for research and development laboratories. All in all, the E+H METROLOGY E+H METROLOGY MX 203-6-33 is an excellent and reliable wafer testing and metrology unit. It offers a wide range of capabilities, making it suitable for a variety of different tasks. With its robust features and ease-of-use, it is an ideal choice for any facility looking to increase its wafer testing and metrology capabilities.
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