Used E+H METROLOGY MX 204-8-25-Q #9227071 for sale

The E+H METROLOGY E+H METROLOGY MX 204-8-25-Q is a cutting edge equipment that provides precise measurements of wafers used for various types of manufacturing applications. This system is equipped with a multi-functional platform that can be used in a variety of different ways. The unit is designed to measure and analyze a wafer's physical characteristics such as thickness, flatness, curvature, roughness, and tilt. The E+H METROLOGY MX 204-8-25-Q is equipped with a number of different technologies that allow for accurate and precise measurements. An interferomatic sensing machine is used to measure the surface contours of the wafer. This precise technology is also able to measure tiny incremental changes in the surface, ensuring an accurate representation of the wafer's topography. The E+H METROLOGY E+H METROLOGY MX 204-8-25-Q also utilizes a specialized optical probing tool that can measure the thickness of a wafer with incredible accuracy. This asset can gather extensive data on the wafer's physical characteristics such as thickness, uniformity, unevenness, curvature, and tilt. Additionally, a multi-focus imaging window can also be used to capture images of the wafer in extreme detail. The model is also equipped with a number of automated and software-based features that greatly simplify the testing and metrology process. The equipment has the ability to measure multiple wafers in rapid succession with minimal manual input. The software system can also be used to store the resulting data and automatically analyze it according to predetermined parameters. The E+H METROLOGY MX 204-8-25-Q is a high-performance unit that can guarantee accurate results. Its combination of advanced technologies and automated features make it an ideal choice for anyone looking for an advanced wafer testing and metrology machine.