Used E+H METROLOGY MX 204-8-37-Q #9234107 for sale

The E+H METROLOGY E+H METROLOGY MX 204-8-37-Q is an advanced wafer testing and metrology equipment used for the inspection and characterization of large-scale wafers. This platform enables users to detect and analyze defects or contaminants on wafers, as well as the properties of the underlying interfaces, quickly and accurately. The system includes a built-in optical microscope and integrated ultra-concise measuring technology that allows for precise measurements in a variety of wafer sizes. The optical unit utilizes an automated focus machine and automatic calibration, allowing for accurate and reliable readings. It can also measure up to 100x magnifications, making it suitable for all types of wafers. Data is collected with a data acquisition module that can be interfaced with a wide range of devices such as machine vision systems, metrology solutions, and digital imaging systems. The measuring technology offers accurate results, with a circularity accuracy of 0.02 µm and a positioning accuracy of 0.2 µm. Additionally, this tool is designed to handle multiple samples of any size, including wafers with sizes up to 300mm, enabling accurate measurement and analysis of even the smallest of wafers. MX 204-8-37-Q includes a user-friendly interface and an intuitive asset for easy data collection. Through the GUI, users can monitor the data collection process and adjust parameters. It is compatible with almost all computer systems, including Windows, Mac OS X, and Linux. The model also supports USB and Ethernet connections, allowing users to easily communicate with the instrument and other instruments on the network. The powerful performance and fast analysis capabilities of the E+H METROLOGY E+H METROLOGY MX 204-8-37-Q makes it an ideal choice for any wafer testing and metrology environment. This equipment easily integrates into existing measuring networks and provides dependable data for reliable wafer-level measurement and characterization.