Used E+H METROLOGY MX 204-8-37-Q #9234110 for sale

ID: 9234110
Vintage: 2007
Wafer measurement system Square / Pseudo-square: 125-156 mm Gauge type: MX 204-8-25-q Thickness range: 200 - 600 μm Real: 180 - 600 μm CE Marked 2007 vintage.
The E+H METROLOGY E+H METROLOGY MX 204-8-37-Q is a wafer testing and metrology equipment constructed using advanced technology that enables it to measure and analyze complex wafers and other components within the semiconductor industry. This system is designed for consistent, high-precision and accurate measurements, as required for both thin film and complex surface measurements. The E+H METROLOGY MX 204-8-37-Q unit utilises a confocal measurement technique for accurate measurement of 3D surface topography features, such as vertical overhang and step height variation with excellent precision and resolution. The machine is capable of measuring wafers up to 200 mm in diameter and features a quick-release wafer holder for rapid and reliable substrate changes. Plus, the measurement station can accommodate the utilization of multiple objectives and probe configurations to meet specific testing requirements. The tool also features a rotary stage specifically designed for the fast and accurate measurement of both plane and step surfaces. It is equipped with a wide variety of optical systems, selectable micro-manipulation stages and a sophisticated pattern recognition asset to automate the identification, selection and sizing of specific features and measurements. The model includes a high-speed image acquisition module with a high-end video camera connected to a powerful PC allowing users to capture and store high-resolution data in a variety of formats, making it easy to transfer and analyze results. It also integrates a cutting-edge program interface that simplifies the task of creating dynamic and interactive user interfaces to handle precision measurements. Overall, the E+H METROLOGY E+H METROLOGY MX 204-8-37-Q is an effective wafer testing and metrology equipment that is capable of providing high precision, repeatable measurements with superior accuracy. With its wide range of features and advanced technology, this system can provide an ideal solution for any wafer testing and metrology application.
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