Used E+H METROLOGY MX203 #9227878 for sale

E+H METROLOGY E+H METROLOGY MX203 is a state-of-the-art wafer testing and metrology equipment designed to provide fast and accurate measurements of wafers. It utilizes a unique combination of optical and physical techniques to obtain precise measurements of wafers' thickness, radius of curvature, tilt, and other characteristics in a non-destructive process. The system utilizes a proprietary design consisting of a two-axis motorized goniometer, which serves as a means of positioning the wafer, and an optical sensor which captures and records the measurements. The optical sensor comprises of a pair of vertical and horizontal lasers, which measure the height profile and curvature of the wafer. This provides a non-destructive, accurate, and repeatable way to measure the wafer's shape and topography. To ensure the accuracy of the measurements, the unit is equipped with a built-in calibration procedure that uses a reference sample. This allows for precise measurement results, regardless of the ambient conditions. The E+H METROLOGY E+H METROLOGY MX 203 also has a powerful built-in metrology software, which processes the data captured by the optical sensor and provides real-time analysis and graphical representation of the results. This allows the user to monitor the wafer's characteristics in a controlled and interactive manner. Additionally, the E+H METROLOGY MX203 is equipped with a motorized vacuum sample holder which helps secure the wafer during measurements to avoid misalignment, ensuring the highest precision and reliability of results. The machine also contains built-in features that help to reduce the time required for measurements as well as providing a quick setup procedure. Overall, the E+H METROLOGY MX 203 is an advanced wafer testing and metrology tool that provides precise, non-destructive, and repeatable measurements of wafers' characteristics. It's powerful metrology software, integrated vacuum sample holder, and calibration procedure enables users to quickly and accurately measure the parameters of a wafer.