Used E+H METROLOGY MX608 #293659180 for sale

The E+H METROLOGY E+H METROLOGY MX608 is a unit specifically designed for wafer testing and metrology. This unit utilizes a direct imaging technique, where a laser beam illuminates the area that needs to be tested. The image is then processed by a CCD camera, allowing the operators to analyze the results. MX608 has a range of features that make it ideal for wafer metrology. It has a high resolution camera and optics equipment which allow for accurate measurements and analysis. The unit can also measure various features such as thickness, warp, and flatness. Additionally, the unit has the capability to measure the surface finish of the wafer as well as any defects. E+H METROLOGY MX608 is a powerful tool for wafer metrology. It has an automated acquisition and analysis system which allows it to quickly analyze and process data. The unit can be programmed to detect, measure, and report a wide range of surface qualities and defects. Additionally, the unit has the capability to generate detailed reports which can provide a comprehensive analysis of the wafer. MX608 also has the ability to measure at a distance or in contact. This provides optimal flexibility and accuracy when analyzing wafer data. Additionally, the unit also has the ability to interface with any external systems for further analysis and data processing. The unit is also designed for maximum efficiency and productivity. It can be operated with an easy-to-use touchscreen interface, allowing the operators to quickly and accurately setup the unit and manage any processing jobs. An extended automation machine allows for further automated or remote control of jobs. In summary, the E+H METROLOGY E+H METROLOGY MX608 is a powerful and efficient unit designed specifically for wafer testing and metrology. It has a wide range of features such as high resolution optics, automated acquisition and analysis, automated job management, and the ability to interface with external systems. Additionally, it provides maximum flexibility and efficiency when measuring wafers. Overall, this unit is a powerful tool for any wafer metrology application.