Used EPIPLUS / ETAMAX Plato #9260679 for sale
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ID: 9260679
Wafer Size: 2"-8"
Vintage: 2010
PL Mapping system, 2"-8"
X-Y Stage
Cassette loading
Flat zone finder
(2) Cassettes for 2"-8" wafer
Spectrometer:
Wavelength range: 420 nm
Hardware pixel resolution: 0.13 nm/pixel
Resolution:
0.5 mm for 2"
1 mm of 4"
2 mm for 8"
Thickness:
Measurement method: Optical interference by reflection
Accuracy / Reproducibility: 3% for GaN film
Photo Luminescence (PL):
Measurement items:
WP (Peak)
WD (Dominant)
Integrated and peak intensity
FWHM
Accuracy:
5% (Peak intensity / Integrated intensity)
<1 nm (Wp / FWHM)
Intensity measurement: High sensitive photo detector
(3) Pumping lasers: 266, 405, 532
Bowing measurement:
Reproducibility: ±5 um
Measuring range: 20 - 4000 um
Cap (2" Profile): <10 sec
Bowing mapping
Input voltage: 220 V
Current: 30 A
Compressed air: 0.2~0.4 MPa
2010 vintage.
EPIPLUS / ETAMAX Plato is a wafer testing and metrology equipment developed by KLA Tencor Corporation. It is designed to inspect and measure semiconductor devices found on semiconductor wafers, in order to ensure quality and reliability of these components. This system uses a range of advanced inspection and metrology techniques, to accurately measure, profile, and inspect the wafer as well as a variety of parameters related to it. ETAMAX Plato unit consists of several core elements: a series of automated wafer stage, advanced optics, and onboard tools to analyze the wafer. The automated wafer stages function to precisely position the wafer beneath the optics, which then captures critical images of the wafer for analysis. The advanced optics, responsible for imaging and scanning the wafers, can be configured to a variety of optical capabilities to fulfill metrology requirements and inspection goals. The onboard tools on EPIPLUS Plato machine include advanced, state-of-the-art software, which automates the process of identifying defects. This software can identify various types of wafer defects based on image patterns, such as nodules, voids, microcracks, and other surface anomalies. Additionally, the onboard tools also consist of metrology scanners and videoscopes that allow users to measure various parameters of a wafer, such as CD (critical dimension) measurements, CD based yields, overlay measurements, and more. Plato tool is equipped with a modular design, allowing a variety of tools and components to be easily added or removed to meet customer needs. As a result, the asset can be highly customized for the needs of any given wafer development process. The modular design also offers an extensive amount of flexibility in terms of model configuration and scalability. EPIPLUS / ETAMAX Plato equipment is renowned for its advanced performance and ultra-high accuracy. It has been proven to provide reliable and repeatable measurement results, which helps to reduce the risk of errors and improve process yields. Overall, ETAMAX Plato is an advanced wafer testing and metrology system developed by KLA Tencor Corporation. Its immense design flexibility, advanced components, and reliable results make it a popular choice for wafer inspection and metrology processes.
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