Used FILMETRICS F10-ARc #293645023 for sale

The Filmtrics FILMETRICS F10 is a state-of-the-art wafer-testing and metrology platform designed for advanced semiconductor process control in the semiconductor industry. It offers a combinatino of various metrology capabilities such as mapping, optical inspection, spectrosopic ellipsometry and scatterometry, as well as unique particle metrology capabilities, enabling advanced process control. It is one of the most advanced wafer testing and metrology systems available in the market and offers a wide range of capabilities. The Filmtrics FILMETRICS F 10 is based on a combination of advanced optics, vision and spectroscopic technologies. It has a unique vision platform called "Vision64 Vision Equipment" and includes sophisticated imaging capabilities combined with advanced image processing algorithms to enable detailed image analysis for wafer level process control. The system is also equipped with "LCM Metrology" control software which features user-friendly and intuitive control software for controlling the entire unit. The Filmtrics F10 has a full automated, periodic and static optical inspection capability. The machine has two large viewing windows which allow inspection of up to four entire wafers with multiple process steps and layers at the same time. The tool also integrates micrometer scanning optics for detailed surface measurements for wafer-level process control. F 10 is capable of characterizing a wide range of process and structures parameters at the wafer level with its unique array of metrology capabilities. It can measure film thickness and CD variation up to 6.5 microns in resolution, along with refractive index and extinction coefficient measurements to better assess material property variations. It also has the ability to measure repeatable and reproducible optical thickness of a variety of materials (including epi layers) with the optional elypsometer enhancements. The asset also integrates the latest technologies for particle contamination analysis, particle size analysis, morphology analysis and defect analysis. Combined with the aforementioned metrology capabilities, FILMETRICS F10 provides comprehensive wafer-level process and quality control capabilities. The Filmtrics FILMETRICS F 10 also offers multiple sampling modes, where users can select up to four wafers at a time to measure process and structure parameters, giving users the flexibility to optimize and improve their process. The model also integrates a sample location recognition equipment which uses machine vision to obtain accurate and consistent sample locations. In conclusion, the Filmtrics F10 is a powerful and advanced wafer testing and metrology system which offers superior process control and quality assurance capabilities. Its unique combination of metrology and particle metrology capabilities makes it ideal for semiconductor process control.