Used FILMETRICS F10-RT-UVX #293825000 for sale

FILMETRICS F10-RT-UVX is a wafer testing and metrology equipment designed to provide accurate and consistent measurements of wafer surface uniformity, thickness and stress. F10-RT-UVX utilizes a combination of advanced optical, electrical, and mechanical components to deliver repeatable, accurate results. The system features three separate components - a controlling PC, a UVX-NIR spectrometer, and a reflex camera - which work together to provide comprehensive measurements. The PC hosts the program interface and is used to access various unit menus and settings, while the UVX-NIR spectrometer is capable of measuring refractive indices and determining thickness via reflectance. The reflex camera captures images used to inspect the wafer and detect surface defects. The machine also incorporates several advanced technologies to improve accuracy, such as a Fizeau Interferometer, which measures optical phase shift to calculate thickness with precision. Additionally, the tool utilizes a UV light source to accurately measure the film's optical properties. This is especially useful in determining the film's absorption and transmission characteristics, which are essential for determining film thickness. The asset's ability to take multiple readings in rapid succession further enhances its accuracy and utility. Sample readings can be taken at various points on the wafer, making it easier to detect and remedy problems quickly. In addition, measurements can be customized to accommodate samples from different industries, such as semiconductors and photovoltaics. Finally, FILMETRICS F10-RT-UVX is designed for long-term use and offers exceptional reliability and durability. The model's components are carefully calibrated and tested to ensure repeatable, precise results. Furthermore, the equipment has been designed for easy maintenance, minimizing downtime for upkeep. In conclusion, F10-RT-UVX is a versatile wafer testing and metrology system that offers reliable, accurate readings for a range of applications. Its advanced optical, electrical, and mechanical components, along with its ability to rapidly take multiple readings, make it an ideal choice for ensuring consistent quality and performance in wafer measurement.