Used FILMETRICS F20-UVX #293646420 for sale

FILMETRICS F20-UVX is a high-precision automated equipment designed to provide precision tests and metrology for the characterisation of thin-film samples on wafers or substrates. It can measure optical properties such as reflection, transmission, absorbance, and refractive indices from the UV to the longer wavelengths such as those of the visible light spectrum. F20-UVX includes a full suite of automated test and metrology capabilities, such as a robotic indexing stage with high-precision sample positioning, and automated wafer mapping. It also features multiple optical-configuration options, including broad- and narrow-beam measurements, push-broom array illumination and MTF-MapperTM scattering measurements, as well as advanced programmability features to facilitate automated process control and precision data-acquisition. FILMETRICS F20-UVX includes a high-resolution XYZ gantry stage, which is capable of micro-positioning the wafer to enable submicron-scale sample measurement accuracy. It also includes an integrated high-speed wide-field imaging system, which can accurately characterise the various optical-property performance across the entire wafer. The unit is capable of capturing fast transient phenomena and its versatile lighting equipment including LED, broad- and narrow-beam illumination rig can be flexibly configured to meet different test objectives. It also provides a direct connection to the automated thin-film thickness mapping machine, allowing total metrology capability. F20-UVX is designed for desktop operation, allowing ease of use and maintenance. It is designed for both laboratory and production environments and is capable of interfacing with most common thin-film systems, resulting in efficient data acquisition and reporting. It also features an automated report generator, which helps reduce the time and effort required to interpret test results. Overall, FILMETRICS F20-UVX is an advanced wafer testing and metrology tool with automated capabilities and a wide range of measuring capabilities. It is ideal for characterising thin-film coatings on wafers and substrates, providing precise and comprehensive data for process-control and research purposes.