Used FILMETRICS F20 #293625658 for sale

FILMETRICS F20 is a leading edge wafer testing and metrology equipment designed to maximize precision, accuracy, and throughput. FILMETRICS F 20 features a two axis, automated stage combined with a fiber optic reflectometer that enables submicron measurements over very large surfaces. The advanced optics and proprietary algorithms of this system provide excellent speed, precision and accuracy in 2D thickness measurements and 3D topography mapping. F20 utilizes a principle that transmits light through an exposed, reflective material and accurately measures the reflected light for the purpose of measuring thickness and film uniformity. The light is transmitted through a fiber optic beam that is directed towards the film or substrate. The light selectively reflects off the surface, and the reflected light is then collected, analyzed and stored. The unit can also measure samples with large surface area (greater than 10cm^2) at an accuracy up to 0.1nm. This allows for film defect identification and evaluation to occur quickly and with more accuracy over a wider range of materials. F 20 is an impressive machine designed to provide operators with efficient and accurate data collection to improve on-line process optimization and reduce yield loss. The compact design and easy to use interface along with the two axis, automated stage make FILMETRICS F20 ideally suited for both laboratory and production line use. Additionally, FILMETRICS F 20 supports large sample sizes that require small sample dimensions with a depth of focus up to 5.0mm. F20 measures thickness, topography and surface roughness with high precision, accuracy and accuracy even over large areas. All measuring results can be displayed in real time on the large and easy to read color display of F 20. The results can also be stored and transferred via Ethernet or USB, allowing users to quickly and efficiently transfer data to other applications. The software suite also provides various statistical tools including sample-to-sample comparisons and customized reporting. FILMETRICS F20 is an advanced, robust and reliable testing and metrology tool designed to maximize efficiency and accuracy in the production of film substrates and measuring surfaces. Using effective optical asset design, proprietary algorithms and advanced computing technology, FILMETRICS F 20 provides repeatable measurements, high speed and accuracy. These features combined with the model's intuitive software, automation and support for large samples make F20 an ideal solution for wafer testing and metrology.