Used FOUR DIMENSIONS 280 #9276884 for sale

FOUR DIMENSIONS 280 is an advanced wafer testing and metrology equipment. It offers precise non-contact measurements of wafer characteristics such as topography, overlay, line widths, micro defect analysis, lithography, defect review, and other critical parameters of device fabrication. 280 system is designed for high-speed wafer metrology. It features a modular design that enables it to accommodate the most demanding measurement requirements with its multiple-beam optical head, multiple-reflector optics, and high-resolution imaging capabilities. The unit achieves accuracy of up to 0.1 nanometer when measuring line widths, and up to 1 nano meter when measuring overlay. Its automated scan pattern ensures repeatable measurement results. The machine's advanced metrology functions are further enhanced by its advanced software. It includes programs for correlative metrology that combine optical and SEM data into one single report, as well as advanced error analysis featuring tools like Z-profiling and autofocus. This advanced functionality accelerates the metrology process and improves measurement accuracy. FOUR DIMENSIONS 280 tool also features seamless integration with SPC systems, enabling operators to quickly evaluate wafers against specification and make necessary corrections. Its graphical user interface makes it easy for operators to use the asset and obtain the desired measurement results. Furthermore, the model's advanced alarm equipment helps operators monitor critical process variables and take corrective action in case of deviations. 280 is ideal for automated wafer testing with high-precision and high-resolution imaging capabilities. Its modular design enables it to accommodate a range of wafer testing requirements while its robust metrology functions ensure accurate and repeatable measurements. The system's advanced software and intuitive graphical user interface makes it easy to use and maximize operators' productivity. FOUR DIMENSIONS 280 is an efficient and reliable metrology unit for analyzing complex wafer characteristics.