Used HITACHI ZA-H200UND #9383303 for sale
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HITACHI ZA-H200UND is a wafer testing and metrology equipment designed for the characterization of both producing and fabricated semiconductor wafers. It offers a wide range of capabilities, including wet etch, defect analysis, particle inspection, LEIS (low energy ion spectroscopy) and QCM (Quartz Crystal Microbalance). ZA-H200UND has a 543mm diameter chamber which can accommodate up to 200 wafers. The system is equipped with a high-speed motor that can rotate the wafer at up to 200 revolutions per minute. The high-speed motor, combined with the chamber's large aperture, enables HITACHI ZA-H200UND to perform precise measurements, such as critical dimension (CD) and defect imaging, during wafer processing and metrology. The unit's high-resolution detectors collect data with excellent accuracy and repeatability. The machine also has a motion control module that enables the user to precisely position the probe in relation to the samples. Data values can be stored or printed directly from the instrument. ZA-H200UND's high image quality is supported by a variety of advanced hardware components. This includes the use of a wavelength compensated lens, enabling the tool to capture images with very low distortion; a color filter wheel, allowing the user to match the wavelength of the sample to narrow the focus and reduce flare; and a stereomicroscope objective lens, providing greater depth of field and allowing the analysis of microscopically small defects. Additional features of HITACHI ZA-H200UND include an automated alignment software package, which enables the user to rapidly align and measure multiple wafers with consistent dependability. ZA-H200UND also utilizes a nanomap feature, allowing the user to easily narrow down measurements to a specific area or device on the wafer. In summary, HITACHI ZA-H200UND is a state-of-the-art wafer testing and metrology asset designed for the characterization of both producing and fabricated semiconductor wafers. It features a high-speed motor, high-resolution detectors, a motion control module, automatic alignment software, and a variety of advanced hardware components that provide the user with the capability to perform precise measurements, critical dimension imaging, and defect imaging. ZA-H200UND's nanomap feature provides the user with the ability to accurately narrow down their measurements, making it an ideal model for advanced wafer metrology and process development.
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