Used KLA / TENCOR 4500 SURFSCAN #9170560 for sale

ID: 9170560
KLA / TENCOR 4500 SURFSCAN equipment is a high-precision wafer testing and metrology system designed for high-volume production. Its unique optical-based FOUP-to-FOUP pce and superior wafer inspection capabilities provide excellent wafer testing and metrology results. KLA 4500 SURFSCAN's intuitive user-interface is suitable for a wide range of users, with automated and semi-automated wafer testing scenarios. The unit features a standard suite of test and metrology tools, including high-speed, high-resolution optical inspection, scanning electron microscopy (SEM) imaging, 3D profilometry, laser etch and photo acuity (PA) testing. TENCOR 4500 SURFSCAN also offers a user-friendly interface coupled with an extensive library of wafer test/metrology programs, a comprehensive set of extraction and reporting tools, and automatic report generation. 4500 SURFSCAN has been designed to deliver user-friendly, high-speed testing for both 200mm and 300mm wafers. Its state-of-the-art optical wafer inspection technology provides fast, reliable, and exact image analysis. It employs dynamic automated wafer targeting that adapts to changing wafer sizes and quickly aligns wafers for scanning. KLA / TENCOR 4500 SURFSCAN's 3D profilometry is a critical metrology tool, capable of measuring profile height, topography, and curvature of wafers. The results are used to optimize production processes, which increases product quality and reduces manufacturing costs. The high-performance and high-precision KLA 4500 SURFSCAN machine is an ideal solution for both production and research needs. Its intuitive, user-friendly interface, reliable automated vision algorithms, and comprehensive metrology capabilities make the tool an excellent choice for both traditional and specialty wafer testing and metrology applications. With its top-of-the-line performance and advanced capabilities, TENCOR 4500 SURFSCAN asset is a comprehensive and efficient solution for today's demand for wafer testing and metrology.
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