Used KLA / TENCOR 4500 SURFSCAN #9252530 for sale

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ID: 9252530
Wafer Size: 6"
Vintage: 1992
Wafer inspection system, 6" Circuit board currently nonfunctional Damaged parts 1992 vintage.
KLA / TENCOR 4500 SURFSCAN equipment is a wafer testing and metrology system used in the semiconductor industry for wafer calibration and testing. The unit provides unparalleled accuracy and precision for the measurement and analysis of advanced-node technology. It features high speed scanning for continuous measurements and utilizes advanced imaging technology to accurately identify and characterize defects. The machine can detect and precisely measure wafer topography and profile features, including varying topologies, contours, and microstructures. The tool is designed for high throughput performance. It supports multi-wafer simultaneous analysis, with topographic measurements acquired at 1-3 seconds per point, depending on wafer size. High resolution images are also acquired at up to 100 μm. On-board digital vision aids in the detection of small particles and other defects. The asset offers users comprehensive testing options and supports wafer planarity validation, thickness measurement, and surface roughness testing. Its large dynamic range enables measurements over a wide range of wafer sizes - from 200 mm to 300 mm. The model was specifically designed to accurately measure advanced-node structures, such as repeated structures over sub-micron lengths and thin, multi-layer structures. Additional features include robust software tools for image analysis, allowing for the easy detection and analysis of critical defects. The automated algorithms and vision technologies used by the equipment enable improved speed and accuracy in defect location. The system comes equipped with advanced capabilities for the determination and classification of contamination, defects, pattern recognition, and other material failures. KLA 4500 SURFSCAN unit is a powerful tool for the semiconductor industry. It provides unparalleled accuracy and precision for the measurement and analysis of advanced-node technology, enabling improved yield and process control. It offers a range of testing options and features large dynamic range capabilities and high-throughput performance for greater efficiency in the production environment.
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