Used KLA / TENCOR 5300 #9194881 for sale

KLA / TENCOR 5300 is the latest in wafer testing and metrology solutions. This equipment is designed for non-destructive testing in semiconductor production processes to match the needs of very small feature sizes on advanced designs. Using exclusive technology combined with the non-destructive measuring capability and advanced automated metrology, KLA 5300 can quickly identify defects in wafers of any size or shape in sizes from 3" to 8", including monocrystalline, polycrystalline and ceramic materials. The system features both mechanical and optical components that enable it to accurately measure the wafer's form and reference levels on multiple positions. It also features a green laser and 4K camera that capture thousands of defects, particles and surface anomalies on the wafer with no extra effort needed by the operator. The robotic handler and advanced software allow TENCOR 5300 to inspect larger-than-normal samples, including larger substrates and gallium arsenide samples, while still being able to accurately detect defects. 5300 also provides a suite of high level algorithms that allow for automated anomaly identification and correction. This provides a highly automated workflow that delivers consistent and accurate defect inspection. Moreover, the unit is capable of scanning multiple layers of a single wafer at the same time, and the multi-layer scan function works without any manual set up. This can dramatically speed up defect detection. KLA / TENCOR 5300 has metrology capabilities for small feature sizes as small as 2 µm, which is especially important for inspection of small, submicron feature sizes that are becoming more common on advanced tech designs. Finally, the machine also provides statistical process control (SPC), a powerful tool that enables the user to track wafer characteristics and have insights into any anomalies that may occur, which can be used to improve the overall process. In conclusion, KLA 5300 is the ultimate Advanced Wafer Metrology Tool that can provide both precision and speed while being able to inspect thousands of defects and particles accurately and efficiently. It is the ideal solution to match the need of advanced designs that require very small feature sizes.