Used KLA / TENCOR 6220 Surfscan #9052288 for sale

KLA / TENCOR 6220 Surfscan is an automated, non-contact optical tool used for wafer testing and metrology. This equipment combines the proven optical technology employed in its predecessor, the 6200 Surfscan, with advanced image processing algorithms to provide high-precision measurement of surface topography. This includes measurement of surface profile parameters, such as surface roughness, step and gap heights, and taper angles. KLA 6220 Surfscan is equipped with a laser profiler, four-axis motorized wafer stage and automated microscope, powered by a CCD camera. When the system is used for critical dimension metrology, the profiler scans the surface of the wafer with laser light to measure its contour. The microscope and motorized stage move across the wafer to capture the 3D shape of the wafer. This data is then used to measure the critical dimensions of the device and to identify any particle or topography defects on its surface. TENCOR 6220 Surfscan has a number of features that make it an invaluable tool for wafer testing and metrology. It has an automated process which allows for large wafer and device analysis simultaneously. It has a powerful image processing unit, which features a customizable workflow for different types of inspection jobs. The machine also features a drift scan algorithm which automatically compensates for vibration and temperature changes that may affect the accuracy of the measurements. The tool can be used for a wide variety of wafer testing and metrology applications, such as defect detection and analysis, Wafer Critical Dimension (WCD) measurement, and wafer topography measurements. 6220 Surfscan asset can detect particles ranging from a few nanometers to several microns in size on a variety of wafers and wafer materials. It is ideal for measuring the critical dimensions of MEMS and other nanoelectronic devices. KLA / TENCOR 6220 Surfscan is a powerful and versatile wafer testing and metrology model. It combines high-precision optical measurement technology, advanced image-processing algorithms, and an automated process to make it an ideal tool for a variety of wafer testing and metrology applications. It is capable of accurately measuring surface profile parameters and detecting particle defects on a variety of wafers and material types, making it an indispensable tool for the fabrication of nanoelectronic devices.