Used KLA / TENCOR 7700 Surfscan #65199 for sale
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KLA / TENCOR 7700 Surfscan is a high-performance wafer testing and metrology equipment designed for the analysis and inspection of semiconductor wafers. It is used to pinpoint defects on wafers and to obtain critical measurement data to improve production. KLA 7700 Surfscan aligns, scans, and processes wafers quickly and accurately and employs advanced technology to accurately identify, characterize, and measure potential defects. Key features of TENCOR 7700 Surfscan system include high-speed digital pattern recognition (DPR), which enables it to detect and measure patterns with high levels of accuracy; fast scanning and processing times, which enable the unit to quickly analyze and measure wafers; and integrated defect print inspection (DPI) and total lithography defect reports (LDR). 7700 Surfscan is able to detect and measure a variety of potential defects on wafers, such as bridging, open connections, and pinholes, as well as contaminants and particles that could negatively affect the wafer's performance. Additionally, the machine's automated defect classification techniques can quickly but accurately classify and measure defects. KLA / TENCOR 7700 Surfscan has a light-sensitive tool to allow for a safe setting for analysis and scanning of the wafers. The high-resolution imaging data is stored in a variety of formats, including TIFF, For Eval, Focal Plane, and JPEG. This allows users to generate sophisticated reports with detailed charts, graphs, and images to better analyze the wafer's properties. It also has a full suite of powerful software tools to program customized recipes for wafer analysis and testing, as well as automated corrective actions. KLA 7700 Surfscan offers users a graphical user interface that is user friendly and intuitive, which allows users to adjust settings quickly and efficiently. The asset is extremely fast and efficient, providing accurate data for long-term analysis. And its advanced technology makes it a superior choice for testing and metrology procedures. The model is frequently used in high-volume production setting to improve quality control, reduce costs, improve process yield, and maximize wafer production. It is an excellent choice for any application requiring fast, accurate analysis and detailed metrology data.
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