Used KLA / TENCOR Acrotec 6020 #293607188 for sale

ID: 293607188
Vintage: 1999
Inspection system PC HDD 1999 vintage.
KLA / TENCOR Acrotec 6020 is a state-of-the-art wafer testing and metrology equipment. It combines a wide range of advanced metrology capabilities and powerful software options to provide a platform for improving process control and gaining critical insights into yield-limiting parameters. It delivers accurate and repeatable measurements with a minimum of operator intervention, robust handling of wafers, and automated alignment and inspection. This system boasts a combination of bright-field, dark-field and laser-illumination imaging tools, layered on top of a 5-axis stages for precise handling of wafers at various angles. Using a precision-tunable laser and autofocus techniques, KLA Acrotec 6020 is capable of measuring the thickness and profile of thin-film and thermal-oxidation layers. It utilizes the latest in imaging and signal processing technologies, a multi-dimensional spectral analysis, and an array of sophisticated algorithms to provide industry-leading pattern recognition capabilities. With its fully configurable hardware setup, TENCOR 6020 offers automated non-contact measurements of many different materials and processes. It is designed to measure parameters such as line widths, facet angles, etch depths, and much more on semiconductor wafers of various sizes. The unit is also capable of handling the most difficult measurements, such as the analysis of low-contrast targets and complex structure geometry. In addition, this machine utilizes advanced defect-detection tools, such as advanced pattern-matching algorithms, to identify and characterize defects that may cause yield loss. Its statistical process control algorithms allow for the timely detection of process drift, as well as for better decisions about product yields. Acrotec 6020 is a powerful and accurate wafer testing and metrology tool that provides reliable data and repeatable results. Its advanced optical imaging and measurement capabilities, coupled with sophisticated software algorithms, give it the ability to measure a variety of material and process parameters with a high degree of precision. With its capability to measure a broad range of parameters and its superior flaw detection capability, KLA / TENCOR 6020 is an essential tool for optimizing process performance, improving yield, and controlling costs in today's highly competitive semiconductor industry.
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