Used KLA / TENCOR ADE 9500 #9170555 for sale

ID: 9170555
Ultra gauge multi-measurement systems Includes: ASC 2000 Controller Dual cassette E-Station.
KLA / TENCOR ADE 9500 is a wafer testing and metrology equipment used in the semiconductor industry. It is a powerful tool for quickly measuring process parameters throughout the wafer fabrication process. It can measure the thickness of layers and layers, depth of features, width of features, and multiple electron beam parameters. It also includes a built-in library for testing and metrology recipes tailored for specific processes. KLA ADE 9500 offers flexible, fast and reliable testing and metrology with its high motion range, precise metrology accuracy, and fast system response time. It is built with a tight integration between the scanning electron microscope (SEM), the motorized stage, and the positioning unit. The station, composed of the motorized stage and the positioning machine, is the key component for testing and measuring the samples. The SEM provides a look at the sample's surface from a number of different angles and the motorized stage allows extremely precise motions necessary for advanced measurements. TENCOR ADE 9500 also includes a number of advanced features, such as AutoFocus, an automatic method for measuring device flatness and roughness as well as layer thickness and roughness. The Measurement Control Suite allows for customization of all tests and measurements through a user-friendly graphical interface. Additionally, layer mapping capabilities are provided to correctly measure the thickness of layers to high accuracy. ADE 9500 has an open architecture that enables integration with other instrumentation and control systems, such as scanning probe microscopes (SPM), stage automation systems, and a variety of computers. Furthermore, it is highly compatible with multi-user systems to enable flexible, fast, and reliable testing. In summary, KLA / TENCOR ADE 9500 is a wafer testing and metrology tool with a comprehensive suite of features for accurately measuring a variety of process parameters. It is built with high accuracy and speed, allowing for complex measurements with a rapid response time. It is highly compatible with other systems and offers an open architecture for integration of multiple instruments.
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