Used KLA / TENCOR AIT 1 #9086398 for sale

ID: 9086398
Wafer Size: 8"
Vintage: 1997
Wafer inspection system, 8" ARGON Laser 1997 vintage.
KLA / TENCOR AIT 1 is a wafer testing and metrology equipment designed to detect defects on semiconductor wafers. The system operates during the front-end fabrication process and provides engineers with fast, accurate and reliable defect detection. The unit is composed of four components: an integrated measurement unit (IMU), scanning wafer stage, digital optical path, and defect inspection tool. The IMU consists of a three-axis motor control machine that can accurately position the wafer stage for scanning. This allows for precise measurements of the defect sizes to within just millimeters. The scanning wafer stage is the platform that the wafer is placed on to be scanned. It consists of a robotically controlled, two-axis, translation stage that is capable of rapid movement over a large area. The scanning stage has two high-precision linear transducers that track the wafer stage and produce a map of the surface of the wafer. The digital optical path, or optical head, is then used to collect the light generated by the stage, analyzing and calculating the position and size of each defect. This data is then used to detect defects. Finally, the defect detection tool is an algorithm-based tool used to analyze the collected data and identify and classify the defects for further inspection. KLA AIT 1 tool is designed to analyze the entire wafer surface at once and provide detailed inspection information on each defect found. Since the asset is automated, it can be used for both manual and automated inspections. Automated inspections are extremely useful for consistent results as they are not prone to human errors. The model is also capable of interfacing with other systems, such as simulation, process control or lithography, to provide accurate information on defect sizes, shapes, and locations. Overall, TENCOR AIT 1 wafer testing and metrology equipment is a reliable and user-friendly solution for semiconductor defect detection. The system provides accurate, precise and comprehensive results that can be used to improve the fabrication process and increase yields.
There are no reviews yet