Used KLA / TENCOR AIT XT+ #9261842 for sale

KLA / TENCOR AIT XT+ is a next-generation wafer test and metrology equipment which provides highly sensitive, multichannel defect detection capabilities to detect and address defects on advanced node semiconductor substrates. The system features electro-optical imaging, an industry-leading review cluster, and QA Vision technology. The electro-optical imaging unit scans a wide array of substrates, allowing for rapid and accurate inspection of wafers. This allows for the detection of particles, scratches, films, masking, and other foreign materials on the wafer which may have caused metrology error. An industry-leading review cluster inspects the image data output from each wafer, utilizing advanced algorithms that are designed to eliminate false defect signals for better sensitivity and fewer false alarms. KLA AIT XT+ is equipped with unique QA Vision Technology through a suite of custom hardware and software called Visual AI. This technology combines advanced machine learning algorithms with traditional disparate inspection methods in order to identify potential defects with high accuracy. This machine brings intelligence to inspection practices, automating the tedious process of visual inspection and enhancing the accuracy of the finding. The tool also includes a wealth of other features to meet the testing and metrology needs of semiconductor manufacturers. It includes advanced defect classification, multi-detector inspection, and die-level resolution for maximum wafer yield. Furthermore, it features automated process integration, advanced defect monitoring, and reporting for rapid characterization and analysis. TENCOR AIT XT+ provides an elegant solution for state-of-the-art wafer testing and metrology. Its combination of high sensitivity, QA technology, advanced classification, and automated process integration make it ideal for semiconductor manufacturers seeking to increase yield through better wafer production. The asset is robust and adaptive, providing accurate defect detection and metrology in a variety of conditions.