Used KLA / TENCOR AIT #293642831 for sale

KLA / TENCOR AIT
ID: 293642831
Wafer Size: 8"
Vintage: 1999
Defect inspection system, 8" 1999 vintage.
KLA / TENCOR AIT is a wafer testing and metrology equipment designed to precisely measure and inspect semiconductor wafers. The system combines optical and computational technologies to detect structural defects and provide an accurate assessment of the quality of the wafers. It captures images of the surface of the wafer with high-resolution digital imaging sensors and processes the data using advanced algorithms. The unit then uses a combination of pattern recognition, automated analysis, and human insight to detect, categorize, and quantify defects. KLA AIT machine covers a wide range of wafer production and process needs, including characterization of critical dimensions, overlay measurements, and defect inspection. Its high-speed optical sensors offer detailed image analysis to identify abnormalities down to the nanometer scale. It is also capable of providing data on the composition and surface of the wafer accurately and consistently TENCOR AIT tool is designed to facilitate efficient throughput and simplify data analysis. It has customizable software and open architecture, allowing users to add hardware as needed and easily modify the software. This makes it ideal for applications that demand quick adaptation and fast analysis such as those found in advanced nanotechnology. The asset also features an automated wafer loader for increased productivity and a low-noise environment for accurate and repeatable measurements. It also includes an environmental monitoring model ensuring reliable performance in any environment. The combination of integrated hardware and advanced algorithms can also be used to identify differences between individual wafers, increasing yield and reducing production errors. The wafer defect and plasma etch rate can also be accurately determined with AIT equipment. KLA / TENCOR AIT is an ideal solution for manufacturers looking for reliable and accurate measurements that can be quickly integrated into their production processes. It is designed to provide the highest level of image quality, defect detection, and performance. Furthermore, the system is highly configurable and can accommodate different types of wafer production. The open architecture makes it easy to integrate new hardware and software, allowing users to modify the unit as their needs change over time.
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