Used KLA / TENCOR Alpha Step 100 #293606740 for sale

KLA / TENCOR Alpha Step 100 is a 'wafer testing and metrology' equipment designed for use in semiconductor research and development laboratories, industrial electronics production, and related applications. It combines advanced contact-based surface profilometry, non-contact optical critical dimension (CD) imaging, and non-contact topography metrology in a single, automated platform. The system supports both manual and automated scanning, allowing for the measurement and analysis of surface topography, grain size, cross-sectional profile, wafer shape, edge beveling, overlay, and micrograph data. KLA Alpha Step 100 has a variety of options for surface-profilometry measurements, including contact scanning, non-contact tracing, stress-relief measurement, and lamellar imaging. The contact scan mode measures the surface of a sample by direct contact, while the non-contact tracing mode acquires high-resolution surface profiles without direct contact. Additionally, the stress-relief option accurately measures stress-induced shape changes in samples subjected to thermal, mechanical, or chemical treatment. Lamellar imaging mode enables users to measure grain-size distributions in aluminum materials, while the anisotropy-measurement mode provides measurements of anisotropy under various surface conditions. For optical CD imaging, TENCOR Alpha Step 100 features multiple software packages, such as Metrotool, Wafertool, Spyglass, and Lottolkit. These enable non-contact imaging of process features such as gate geometries, line and space widths, cross-sectional profile, and overlay data. The topography metrology capability employs advanced non-contact techniques, such as interferometry, optical coherence tomography (OCT), and confocal microscopy, to measure sample shape and surfaces with high resolution. The unit also provides automated detection and measurement of edge beveling and other compound features. In addition to its various measuring capabilities, Alpha Step 100 offers a range of automated data processing functions, such as user-selected edge detection, automated particle analysis, automatic image stitching and tiling, and false-color reconstruction. The machine's automated scanning feature allows for quick and accurate data collection, while its intuitive control software provides users with effortless control of all hardware and data acquisition functions. Overall, KLA / TENCOR Alpha Step 100 tool provides reliable and precise measurements for wafer testing and metrology purposes. It is a versatile, easy-to-use, and cost-effective asset for single-point and multiple-point studies.