Used KLA / TENCOR Alpha Step 200 #293600510 for sale

KLA / TENCOR Alpha Step 200 wafer testing and metrology equipment is an automated test and analysis system capable of measuring the electrical and physical properties of semiconductor devices. The unit utilizes differential interference contrast (DIC) microscopy and optical scattering techniques to measure electrical, mechanical and structural properties on a range of substrates. The machine also provides data analysis to detect non-uniformities and is capable of detecting premature failure of individual devices. KLA ALPHASTEP 200 utilizes several different test techniques including SEM/ ESEM,SEU, OBIRCH and EBIRCH. SEM and ESEM are Scanning Electron Microscopy techniques used to detect electrical, mechanical and structural defects due to surface, metal and insulating films. SEU and OBIRCH are Scanning Electron Spectrometry techniques to analyze electrical and physical properties such as sheet resistance, inter-layer capacitance, and contact resistance. EBIRCH (Electron Backscattering Imaging) is used to detect high-resolution images of thin films and defects. TENCOR ALPHA-STEP 200 utilizes a large field-of-view (FOV) which allows up to eight samples to be tested per unit area. This allows for the highest concentration of measurement points per sample, the highest throughput and the best uniformity. The tool is able to accurately detect small defects down to 1 micron. The asset also utilizes a high sensitivity detector which is capable of detecting small changes in the sample properties due to aging and environmental influences. KLA Alpha Step 200 has advanced imaging tools to support defect analysis and visualization. The model features automated image stitching algorithms which allow for the creation of large area maps from individual images. The equipment also utilizes powerful data analysis tools such as cross-sectional measurements, statistics, calculated indices and time-lapse measurements. These provide an automatic defect result in semiconductors and dielectrics. This system is ideal for the detection of yield or process variation, measurement of physical properties including surface topography, thin films and electrical characteristics. The unit's robust operation and optimal throughput make it the perfect choice for improving yield in the most demanding production environments.