Used KLA / TENCOR Alpha Step 200 #9315702 for sale

KLA / TENCOR Alpha Step 200 wafer testing and metrology equipment is designed to provide highly precise and reliable measurements for a wide range of semiconductor and MEMS applications. Using KLA advanced Vision software-enabled algorithms and optical systems, KLA ALPHASTEP 200 provides unparalleled accuracy and speed in a compact, easy-to-use package. The system features a patented non-contact method of inspecting wafers, enabling fast and reliable measurement of critical parameters such as critical dimension (CD) and overlay mark offset, as well as the spatial and temporal response of surface-treated wafers. TENCOR ALPHA-STEP 200 employs an integrated charge coupled device (CCD) detector and multiple detectors mounted on a precision turntable to provide a large field of view. Additionally, the unit is equipped with a high numerical aperture (NA) optical design and provides both multi-wavelength and multi-crystal illumination. The advanced Vision algorithms allow the machine to detect and discern patterns at an extremely high-resolution, with measurements accurate to 0.5 nanometers. This enables reliable and precise measurements of both thin and thick film surfaces, and enables the tool to better detect and isolate structural features such as photoresist lines, cuts and sharp corners. The asset offers a wide range of features and options, allowing it to be tailored to meet a range of testing and metrology needs. It includes a variety of options for controlling scan magnifications, step sizes and field sizes to accommodate small and large regions of interest. ALPHASTEP 200 is also equipped with a series of software-controlled automation features, which enable high throughput and efficient testing. In summary, TENCOR ALPHASTEP 200 wafer testing and metrology model is designed for fast and reliable measurement of critical parameters and structural features in semiconductor and MEMS applications, offering an unprecedented level of accuracy and speed. The advanced Vision software-enabled algorithms and high-resolution CCD detector enable the equipment to reliably detect and discern patterns at a sub-micron level, and enables automation for high-throughput and efficient testing.