Used KLA / TENCOR Alpha Step 500 #189545 for sale

KLA / TENCOR Alpha Step 500 wafer testing and metrology equipment is a tool that is used for characterizing and monitoring the development of thin film materials by measuring the depths of films and overlayers on semiconductor wafers. The system combines several advanced metrology techniques, such as Atomic Force Microscopy (AFM), ellipsometry, and spectroscopy, to provide a detailed characterization of thin films. KLA Alpha Step 500 has a high-precision scanning mechanism that enables it to measure thin films down to nanometer-level accuracy. The instrument is able to scan in 50, 100, 150, 200, and 250nm increments for accurate depth measurements. The unit is also capable of measuring film thickness to thicknesses as low as 200nm and can identify subtle variations in the thickness of thin films down to 1nm increments. Additionally, the machine is capable of analyzing a variety of film materials including aluminum, copper, zinc oxide, and tantalum nitrate. TENCOR ALPHASTEP 500 tool is also capable of measuring film deposition rates in order to monitor thin film development. For instance, the asset can measure the deposition rate of a film over time, which enables developers to adjust the growth rate of the material (for instance, to increase or decrease growth rate) in order to optimize the desired characteristics. Additionally, ALPHASTEP 500 has the ability to measure the refractive index of the material being tested, which can provide insights into the physical characteristics of the film. KLA / TENCOR ALPHASTEP 500 also has the capacity to monitor surface contamination, which can be a key factor in the overall performance of a chip. The model is capable of measuring surface particles down to 0.7 microns in diameter and can detect the presence of contaminants such as dust and water particles. Furthermore, the equipment has the ability to identify and measure the size and shape of particles in order to provide an accurate and comprehensive characterization of the thin film. In addition to providing detailed insight into the surfaces of wafers during production, TENCOR Alpha Step 500 can also be used to inspect finished products for particle contamination. The system can identify embedded particles in substrates and can also analyze material defects such as voids and pinholes. The unit can also be used to measure the surface topography of the wafer to provide detailed information on the form and position of particles. Overall, KLA ALPHASTEP 500 is a highly accurate and precise wafer testing and metrology machine that provides comprehensive characterization of thin films and substrates. The tool provides detailed insights into the characteristics of thin films and can be used to monitor the development of films, measure deposition rates, and inspect finished products. The asset also has the capacity to identify and measure particles as small as 0.7 microns in size and can provide in-depth analysis of material defects and surface topography.