Used KLA / TENCOR Alpha Step 500 #9300224 for sale
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ID: 9300224
Vintage: 2001
Surface profiler
Stylus-based surface profiler adjustable between 1 and 100 mg
Computer controlled scanning and data collection
VGA Monitor zoom optics
Multi-scan average mode scans up to 10 times
Surface parameters selections: Up to 30
Surface characteristic measurement:
With resolution to 1A
2D Metrology profiling: 10Å (1s)
Repeatability enables process control: 0.1%
With step height metrology
Below 50 nm to 300 µm
2001 vintage.
KLA / TENCOR Alpha Step 500 is a wafer testing and metrology equipment designed for reliable and accurate measurements. It uses powerful software and hardware to perform high resolution measurements of the physical characteristics of semiconductor wafers. The system can be used for both destructive and non-destructive testing of thin films on semiconductor wafers. For non-destructive testing, KLA Alpha Step 500 uses confocal derived imaging (CDI) that produces three-dimensional images of the wafer surface. CDI images allow precise measurement and understanding of surface topographies to below 1nm. For destructive testing, a piezoelectric force microscopy (PFM) is used to image wafer structures and for testing thin film stress. PFM uses a nano-scale cantilever tipped probe to interact with sample surfaces and create images of individual layers beneath the top surface of the wafer. Stress measurements are necessary to help ensure the structural integrity of vital circuits and electronic components. TENCOR ALPHASTEP 500 uses two different scanning probe microscopy (SPM) techniques to measure thin film stress. Both technique measure the change in a sample's dimensions as a tip is pressed into the surface. From these measurements, the stress strain characteristics of the sample can be determined. ALPHASTEP 500 is also ideally suited for meeting the global industry standard for post metrology analysis and review. The unit performs a variety of tasks, including isolating and identifying product characteristics, analyzing and reporting the results of multiple tests simultaneously, and executing automated inspection and analysis of wafer surfaces. Finally, KLA ALPHASTEP 500 offers industry-leading performance, accuracy, and reliability. It features a high-resolution image capture machine, easy-to-use intuitive software, and automated scanning capabilities to ensure accurate and reliable measurements over extended time frames.
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