Used KLA / TENCOR ASET F5x #9240546 for sale
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ID: 9240546
Wafer Size: 8"-12"
Vintage: 2003
Film thickness measurement system, 8"-12"
8" Conversion: Insert type
Data transfer: Floppy disk / DVD R/W
Operation: Mouse & keyboard
Emergency button cover: Recessed type
Door interlock
Recipe auto backup
Auto data deletion
Auto error log file save & classification
Queued loading (Queue recipe)
Operating system: Windows XP
Spectroscopic ellipsometer
Spectrometer
Wavelength of light source: 220~800 nm
Spot size for thickness & RI: < 40μm
Spot size for reflectivity: < 40μm
Mapping function: 2D & 3D
Pattern recognition
Recipe copy with film library
SE & DBS Optics
Optic lens: 1x, 2x, 4x, 15x
Pattern score: FA
Location screen: Visualize on one screen
Pattern recognition image / Measurement site save
Spectrum save function (Save all at once)
Spectrum save and auto deletion (Save everything, Hard Disk Drive (HDD))
Recipe / Library import: On-time intromit at TCP/IP
AMHS
Project
Signal tower
Wafer breakage: ≤ 1/100,000 Cycles
S3 Handler
Options:
GEM SEMI E30-98
SECS II SEMI E5-93
Recipe generator
Remote access capability
Light tower
Carrier ID, 12"
Safety shield, 12"
Light tower
HSMS Communication
Recipe generator
S3 Handler
Controller:
CPU: Pentium 4 3.0 GHz
Memory: 1.024 G Byte DRAM
(2) Hard Disk Drives (HDD): 80 GB
2003 vintage.
KLA / TENCOR ASET F5x is a multi-sensor metrology equipment used for wafer testing and metrology. It is designed to provide reliable and precise measurements of the various layers within a wafer sample including silicon, metallic layers, and organic layers. Its multicomponent detection technology is used to measure the electrical properties and physical structure of the test sample. The system consists of a multi-axis platform, a high resolution stage, and a high quality imaging unit. The multi-axis platform has the ability to move the sample wafer at high speeds with high accuracy, allowing the testing machine to collect a wide variety of data quickly. The high resolution stage is highly precise, allowing the tool to measure the properties of the wafer down to the nanometer level. The imaging asset uses optical techniques to detect the features of the test sample, giving the wafer testers insight into the structure of the sample. KLA ASET-F5X is designed with the highest level of functionality in mind. It is easy to use, with a user-friendly web-based interface and automated as well as manual testing processes. The model can provide measurements of high accuracy within minutes due to its powerful algorithms and precise instrumentation. It is also equipped with real-time feedback, allowing engineers to monitor data in real-time and make real-time adjustments to the testing process. TENCOR ASET F 5 X utilizes advanced microscopy techniques, such as electron microscopy, as well as conventional optical imaging to build an image of the test sample. The microscopy techniques provide detailed information about the sample's properties, while the optical imaging allows the testers to measure the properties of the sample in a non-invasive way. This allows for an efficient way to collect accurate readings on a wide range of parameters within the test wafer. The equipment is designed to be highly robust and reliable, allowing for high throughput of tests and accurate results. The system is also designed for high performance, allowing for high-resolution measurements and improved accuracy. This unit is an ideal solution for semiconductor and electronics testing, providing fast, reliable and precise data for a variety of wafer applications.
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