Used KLA / TENCOR ASET F5x #9254566 for sale

KLA / TENCOR ASET F5x is a wafer testing and metrology equipment designed for metrology and defect review applications. It increases critical defect detection performance with the newest and most advanced detection system. The unit is designed to address critical and complex requirements for comprehensive defect detection and improved yield. It has also been designed to provide a wider range of automated wafer test, metrology, and defect review capabilities. The machine is equipped with a sequential scanning technology and integrates seamlessly with defect inspection and tune-up tools. The integrated technology helps improve process performance and reduce throughput time. It features an integrated Active Optical Sensor (AOS) to capture the most challenging defect features, with significantly higher resolution and greater throughput speed than alternatives. KLA ASET-F5X has been designed to enhance the software features of existing and planned KLA/TECON imaging systems. It also integrates seamlessly with existing equipment, providing automatic package analyzer, package stress measurement, photo-facial imaging, reconditioning, and a wide range of advanced slotting operations. It comes with an automated optical inspection tool for wafers and photoresist inspection. It is designed to connect to a wide range of optics and subsystems, enabling users to configure, customize and automate their current and future testing and metrology processes. The asset also supports multiple software tools, including TENCOR real-time process monitoring, KLA / TENCOR Auto Focus, KLA flow-based defect detection, and many more. TENCOR ASET F 5 X model offers a complete solution for testing, metrology, and defect review applications. Featuring advanced detection technology and high throughput speeds, the equipment is designed for high-end metrology and defect review applications. It offers a wide range of automated wafer test, metrology, and defect review capabilities. The system is designed to work with all current and future generations of imaging, inspection and metrology systems. It is designed to increase critical defect detection performance and reduce throughput time.