Used KLA / TENCOR C2C/FT #9409302 for sale

KLA C2C/FT is a wafer testing and metrology equipment that provides high-resolution imaging and accurate parameter measurement for the inspection of semiconductor and photovoltaic wafers. It features a configurable platform that supports a wide range of process technologies and is designed to enhance 3D yield analysis. The system is capable of using multiple imaging modes such as brightfield/darkfield, spectroscopy, and microscopy to capture images and obtain precise measurements. It also provides automated defect placement and categorization, particle-level defect detection, wafer-to-wafer comparison and more. Its patented spectral imaging technology eliminates the need for fluorescent filters and can accurately detect parameters for die and/or circuit inspection such as photovoltaic cells and related components. The C2C/FT unit features a high-performance precision stage with adaptive area mode beam stiching technology that enables rapid on-the-fly scanning and calibration, which helps improve throughput levels. A fully integrated real-time defect review enables real-time analysis and insightful defect characterization. The machine's advanced artificial intelligence capabilities facilitate accurate metrology and automated process control. In addition, the tool offers an integrated Smart Process Monitoring & Control asset that provides real-time diagnostics, process metrology, data extraction and analysis. It features multiplexed architecture and multi-spectral/die-level imaging to ensure accurate and reliable data with fast turnaround times. The model can function in fabless environments and is ideal for a wide range of processes such as advanced optical and semiconductor lithography, CMP, polishing and advanced defect reduction. Overall, TENCOR C2C/FT is an advanced wafer testing and metrology equipment that provides imaging, parameter measurements and defect characterization for semiconductor and photovoltaic wafers. Its configurable platform and high-performance capabilities are ideal for reducing defect levels and optimizing process control.