Used KLA / TENCOR Candela C2 #96305 for sale
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ID: 96305
Surface Inspection system, 4", parts machine
Requires a new computer and KLA software license
Currently installed in the fab
2002 vintage.
KLA / TENCOR Candela C2 is a wafer testing and metrology equipment that is used both in process development and production control. It has a highly advanced, powerful capability that makes it the world's most efficient tool for measuring thin-film thickness and pattern parameters on wafers. It provides precise, fast measurements of both thin-film and pattern parameters on wafer surfaces. KLA Candela C2 system features a state-of-the-art, fully automated unit that performs both non-contact and direct contact measurements. It combines advanced optical systems with advanced software to offer superior, high-resolution thin-film and pattern parameters measuring capabilities. With TENCOR C2, it is possible to measure a wide range of wafer topography parameters, such as film and pattern heights, surface area, angles, step heights, and many more. The instrument also offers a high dynamic range to accommodate a range of process sensitivities. Its precise metrology capabilities enable it to accurately measure various thin-film characteristics and pattern parameters. Candela C2 also provides excellent process monitoring and control, allowing users to identify process variations and to fine-tune the process. The machine also features high-speed and precise data acquisition capabilities. It is equipped with a powerful software package that easily acquires and processes high-resolution measurements. The software is able to provide precise measurements as well as to compare and analyze the results. KLA C2 also comes with a range of user-friendly interfaces. It is compatible with both Windows and Linux, and is also available in multiple languages. In summary, C2 is an all-in-one wafer testing and metrology tool that provides precise, fast measurements of multiple thin-film or pattern parameters on wafer surfaces. Its advanced capabilities allow users to identify process variations, as well as to fine-tune the process. The user-friendly interfaces and high-speed data acquisition capabilities make this asset an ideal choice for wafer testing and metrology applications.
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