Used KLA / TENCOR Candela CS10 #9389847 for sale

KLA / TENCOR Candela CS10
ID: 9389847
Surface inspection system.
KLA / TENCOR Candela CS10 is a wafer testing and metrology equipment designed to provide complete measurement and testing of the wafers' surface and properties at the nanoscale level. The system is equipped with advanced optics and imaging technology, enabling the precise and accurate characterization of the wafer surface and physical parameters. The integrated detector and signal processor provide high-resolution measurements of the wafer surface on a nanoscale level. KLA CANDELA CS-10 utilizes laser interferometry, scatterometry, parallel phase-shift interferometry, and optics module for non-contact measurements. A beam of laser light is directed to the sample surface, and its reflected spectrum is used to assess the wafer properties. Additionally, the unit integrates 3D non-contact surface profilometry, enabling accurate determination of the wafer's topography and critical parameters such as overhangs, burrs, and voids in the surface. TENCOR CANDELA CS 10 is equipped with a dual-head tilt-and-rotation stage, which allows for precise wafer handling and navigation. It is capable of very fast measurements, allowing the machine to survey large areas quickly and accurately. Furthermore, the built-in lamination and oven controller allow for wafer polishing and process optimization. The software tool included with CANDELA CS 10 allows for easy visualization, reporting of results, and automated process control. The asset is capable of automatic data logging and curve fitting, enabling precise analysis, comparison, and reporting. Additionally, it provides flexible data manipulation functions, allowing custom analysis. Candela CS10 is designed for superior performance and versatility. With its advanced optical components and imaging technology, precision automation, and comprehensive software capabilities, the model provides complete and accurate characterization of the wafer's surface and physical properties. This thorough characterization enables reliable analysis, comparison, and process optimization, thus making it an invaluable tool for wafer testing and metrology.
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