Used KLA / TENCOR FLX-2320 #293633036 for sale
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ID: 293633036
Wafer Size: 8"
Vintage: 1997
Thin film stress measurement system, 8"
2-D/3-D Mapping
Dual wavelength measurement: 670 nm and 780 nm
Resolution: 3e^-5 m^-1
Minimum scan step: 0.02 mm
Minimum radius: 2.0 m (Scan length: 80 mm)
Chuck size, 8"
Temperature: 500°C
Manual wafer load
Floppy drive, 3.5"
No dongle
Chuck heater
PC included
1997 vintage.
KLA / TENCOR FLX-2320 is a next-generation wafer testing and metrology equipment designed for maximum efficiency and performance. KLA FLX-2320 is capable of handling 9" to 200mm wafers and supports a wide range of wafer testing and metrology applications. The system's touchscreen digital graphical user interface makes it easy to operate and provides a versatile environment for customizing and optimizing testing processes. TENCOR FLX 2320 features an ultra-low-noise architecture and high-speed scanning to enable fast and accurate data acquisition. The unit provides sub-nanometer resolution with fast throughput, reliable measurements and high-sensitivity imaging. The machine also boasts an extended sensing range, with 0.1 nanometer detection capability, enabling a wide variety of metrology applications to be performed accurately and quickly. KLA / TENCOR FLX 2320 is highly integrated and offers automated wafer handling, magnification and stage control. The wafer testing processes are enhanced with embedded optical metrology software, providing accurate and repeatable measurements. The tool also offers a variety of connectivity options, such as digital imaging, inspection and analysis components, for integrated wafer testing and inspection. TENCOR FLX-2320 also offers a number of advanced features, such as automated pattern recognition, non-destructive imaging and visualization of core defects, and automated tool suggestion for optimal testing applications. The asset has been specifically designed to reduce cycle times and improve throughput, while ensuring traceability and quality control. Overall, FLX 2320 is an advanced wafer testing and measurement model for the semiconductor industry. From wafer alignment to metrology analysis, KLA FLX 2320 offers a versatile and powerful platform for automated testing and metrology. With its high-speed scanning, low-noise architecture, extended sensing range and automated features, FLX-2320 is capable of delivering fast and accurate measurements, enabling significant improvements in throughput and efficiency.
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