Used KLA / TENCOR HRP 220 #9276589 for sale
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ID: 9276589
Surface profiler
Maximum scan length: 205 mm
Measurement head with UltraLiteTM sensor:
Vertical range: 0-130 um
Stylus force: 0.05-10 mg
Constant stylus force control
Top view dual-magnification optics:
Black and white camera
L-Stylus: 2 um
Radius: 60°
Dual-stage system:
Sensor stage with 1 nm resolution
Long range sample stage with 205 mm scan length
Motorized level and rotation
Wafer handler:
Dual 200 mm cassette position (100 mm / 125 mm / 150 mm)
With locator
Flat / Notch orientation finder
Integrated vibration isolation system
PC Minimum configuration:
Pentium III Processor: 650 MHz
RAM: 128 MB
Hard drive: 80 GB
Ethernet network adapter card
LCD Monitor, 17"
Floppy disk drive, 3.5" (1.4MB)
Operating system: Windows NT
SECS / GEM Interface.
KLA / TENCOR HRP 220 is a wafer testing and metrology system, designed for measuring and evaluating the optical, electrical, and structural characteristics of thin film layers on silicon wafers, during the course of semiconductor manufacturing. It utilizes optical scatterometry technology, in combination with an integrated active platform, to provide precise, high-resolution measurements of a wafer's surface over a range of wavelengths, angles, and depths. KLA HRP220 is equipped with five wavelength lasers and high-precision, heavy-duty sheet motors for precise motion control. Its vector laser scatterometer features a high-bandwidth frequency-doubled neodymium-doped yttrium aluminum garnet Laser (Nd: YAG) combined with a low-noise photo diode array, allowing accurate results to be obtained at all wavelengths. Its advanced optics enhance throughput times, while the ability to move the optical path means that different portions of the wafer can be measured without manual entry or movement. TENCOR HRP-220 is also capable of measuring a wide variety of characteristics, including refractive index, optical penetration, scatterers, and surface roughness, as well as non-destructively testing layers of differing materials such as silicon nitride, polysilicate glass, and aluminum oxynitride. Its integrated active platform consists of an electrical testing system, variable optical tables, and a dedicated user interface, all of which are designed to be controlled from a single location and provide the user with complete control over wafer testing and metrology processes. HRP 220 software offers users a large selection of features and options, enabling them to analyze and assess their data quickly and easily. It features several modules, each designed to measure and analyze different characteristics of a wafer, as well as a library of commonly used templates for improved utilization of data. It also offers advanced graphics processing capabilities — ideal for visualizing and analyzing complex data. With its comprehensive capabilities, KLA / TENCOR HRP-220 makes it possible to quickly and accurately test and analyze the structural and functional properties of wafers, supporting research and development activities, or used for production reuse.
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