Used KLA / TENCOR P10 #9301230 for sale

KLA / TENCOR P10 is a wafer testing and metrology equipment developed by KLA Corporation. It is designed for advanced wafer inspection and metrology applications in semiconductor manufacturing. KLA P-10 system leverages TENCOR patented Scanning Near-field Optical Microscopy (SNOM) technology which allows for precise metric measurement and defect classification of structures down to 2 microns. The unit is capable of inspecting wafers up to 300mm in diameter, and can accurately detect defects as small as 10nm. The main component of the machine is its high speed, scanning electron microscope (SEM) head, which is used to capture a high resolution 3-dimensional image of the wafer surface. The SEM head is connected to the optics unit of TENCOR P 10, which provides the light for the microscope. The optics unit features advanced illuminators and detectors that allow for sub-surficial imaging. The powerful imaging algorithms used in the tool help to identify small defects such as contamination, etch and damage. Additionally, the asset is capable of recognizing patterns and operations patterns such as bumps, trenches, and other metrology features. The software used in the model enables a wide range of analysis and measurement tools that allow it to provide detailed information about the wafer condition. This includes defect size analysis, overlay and dimensional measurements, topology analysis, metrology feature analysis, and CD/OCD measurement. Furthermore, the semi-automated equipment maps out a plan for the wafer analysis and testing, and allows for easy operation. The user-friendly software included in TENCOR P10 equipment allows for easy setup and operation. With the software, users can create custom recipes for wafer inspection and metrology, and configure the system for specific customer needs. Additionally, the software offers a comprehensive set of tools for data management, error detection and analysis. In conclusion, P 10 wafer testing and metrology unit is a powerful solution that offers high accuracy, speed and flexibility for wafer inspection and metrology. It leverages the powerful imaging algorithms, illuminators and detectors of the machine to provide valuable metrics and data that are essential to the semiconductor manufacturing process.