Used KLA / TENCOR P11 #9281222 for sale

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ID: 9281222
Wafer Size: 8"
Surface profiler, 8".
KLA / TENCOR P11 wafer testing and metrology equipment is an automated inspection and analysis system designed to provide fast, reliable, and consistent results in the inspection and characterization of wafers at the nano scale. This unit leverages the latest in automated optical inspection and image analysis technology to provide the highest quality scanning and characterization data with minimal operator intervention. KLA P-11 utilizes a powerful suite of hardware and software technologies, including a high-resolution CCD camera and a state-of-the-art non-contactmetrology toolset. This machine is capable of scanning and analyzing wafers with a size range of 200mm to 600mm. TENCOR P 11 is also equipped with a range of patterned inspection capabilities, such as imaging of line, space, and array features, imaging of fine pitch features, and basic silicon defect navigation. Furthermore, it is capable of pinpointing well-defined areas of the wafer surface with both spatial and spectral accuracy. In addition to its scanning and analysis capabilities, TENCOR P11 also includes an advanced metrology toolset, which includes spectroscopic analysis, surface and thickness measurements, Edge Detection and S/TIL Mapping, and defect characterization. It also features multi-channel capabilities for simultaneous scanning and analysis, allowing for fast measurement of large areas. P-11 also implements process control measures, allowing for the inspection and verification of manufacturing process results. This tool is equipped with an integrated Automation Library, which simplifies the creation and execution of automated processes, making it possible to create automated inspections to reduce error rates and maintain quality standards across multiple production lines. Overall, KLA P11 is a robust, versatile, and high-performance wafer testing and metrology asset that is designed to provide fast, reliable, and consistent results in the inspection and characterization of wafers at the nano scale. In addition to its powerful suite of hardware and software technologies, the model also leverages process control measures that allow for the determination of manufacturing process results. This combination of features makes it an ideal choice for the inspection and analysis of wafers in the semiconductor industry.
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