Used KLA / TENCOR P11 #9397724 for sale
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KLA / TENCOR P11 Wafer Testing and Metrology equipment is designed to enable high-precision measurements of wafer properties, such as surface topography, feature sizes, and defect characteristics. KLA P-11 is equipped with several optical and electrical probes and sub-micron resolution motorized scanning technology to accurately analyze a wide range of wafer substrates. These measurements allow engineers and scientists to characterize individual structures in high-volume production environments while still achieving accurate measurements of parameters such as surface finish, line widths, critical dimension uniformity, and defect distribution. The system features an all-optical design that is capable of providing wide-field imaging and nanometer-scale precision measurements. A movable laser source illuminates the wafer sample which is then reflected off of the surface and collected by an optical receiver. An imaging module is then used to capture the collected data and store it for later analysis. To analyze the collected data, TENCOR P 11 utilizes several physical and mathematical algorithms. These algorithms are used to calculate surface contours and reveal the profile of the sample. They are also used to look at surface defect characteristics and measure the sizes of features. The unit also contains a series of pattern recognition tools that enable recognition and extraction of features, such as line widths, critical dimension uniformity, and defects, from the sample. In addition to these features, KLA / TENCOR P 11 also features a sophisticated user interface featuring an intuitive graphical user interface with several touch-screen menus. Manual and automated inputs are supported and the machine is capable of storing and cataloging data to enable data tracking and workflow management. The tool is also equipped with several security precautions to ensure data integrity and prevent data loss. P11 Wafer Testing and Metrology asset is a powerful tool for providing accurate and reliable measurements for wafer substrates, making it an essential tool for process engineers and scientists working in semiconductor production environments.
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