Used KLA / TENCOR P12 #293800615 for sale

KLA / TENCOR P12 is a wafer testing and metrology equipment developed by KLA, a global leader in process control solutions. The system provides the capability to measure a wide range of critical parameters, including critical dimension (CD) variation, overlay, small and large flatness, defect detection, thin film thickness and more. The unit is designed for maximum wafer-to-wafer throughput, quality and productivity. KLA P 12 uses a sub-nanometer accuracy X-ray laser confocal based machine combined with advanced pattern recognition software to deliver a superior analysis. At the heart of its advanced testing capabilities is an innovative illumination design, which enables the tool to detect both actual device features and film layers. The multispectral detector array enables high precision, rapid and non-destructive measurement of CD, overlay, deposited films and other features. The asset is equipped with a 6-axis wafer stage and a large 200mm wafer capacity, providing high speed throughput and non-stop motion. The advanced optics and lighting design provide optimum measurement of features down to sub-micron levels. TENCOR P-12, provides several optical configurations to inspect feature sizes and materials, as well as inspection field-of-view (FOV) settings and zooming capability. At the software level, P 12 is equipped with powerful analysis and visualization tools to properly display information in the form of various charts and graphs. The model also provides global alignment, a feature that compensates for misalignment between the test die and the target, thus increasing accuracy and throughput. P-12 also supports multiple test configurations, allowing customers to optimize the number of samples tested. Flexible automation support provides seamless integration into existing production processes, and a wide range of communication interfaces allows for multiple data transfer methods. In summary, KLA / TENCOR P 12 offers a complete wafer testing and metrology solution that combines superior metrology accuracy, throughput, and flexibility to ensure the highest quality and productivity in the manufacturing process.