Used KLA / TENCOR P15 #293616961 for sale

KLA / TENCOR P15 is an advanced wafer testing and metrology system that enables precision measurement and analysis of wafers used in the fabrication of semiconductor devices. It offers a broad range of capabilities for wafer surface measurements and includes three-dimensional (3D) reflectometry, diffraction, scatterometry, stereology and surface topography. KLA P-15 utilizes a high-power laser beam to scan and analyze the surface of the wafer. After the scan is complete, the data is analyzed for a variety of characteristics such as grain structure, crystal orientation, texture, thickness and ridge count. It can also measure critical dimensions and take measurements from any angle. Additionally, the system has capabilities to detect variations in wafer thickness, defect areas and wafer-wide image analysis. TENCOR P 15's 3D reflectometry tool provides precision based on its innovative design providing high-speed, high-resolution measurements that enable nanometer-level metrology of wafer characteristics. This is achieved by the use of a high-power laser beam which enables fine measurements with no shadows, even on laser-textured surfaces. The 3D reflectometry can also provide simultaneous analysis of multiple parameters such as texture and roughness. KLA P 15's diffraction metrology allows for enhanced optical characterization of the surface of the wafer. This includes the ability to determine specific crystallographic orientations and determine grain size which is essential for clear characterization of the microstructure of the wafer. The scatterometry tool, on the other hand, is used to measure the diffraction pattern of wafers. This allows for an accurate determination of the surface structure and layer thicknesses of the wafer. TENCOR P15's stereology tool provides high precision measurement of fine structures. It uses high-definition imaging at multiple up-and-down depths to determine the 3D topography of the wafer. This can be used to measure the fine details of patterns and structures on the wafer that are otherwise impossible to detect with traditional metrology techniques. KLA / TENCOR P-15 also offers advanced surface topography measurement capabilities. This allows for detailed mapping of surface topography over large areas by using a combination of confocal and interferometry techniques and imaging. The system has the resolution to detect even the finest and smallest surface features. Overall, KLA / TENCOR P 15 is a powerful tool that provides advanced, precise measurement and analysis capabilities for a wide range of semiconductor and other wafer applications. Its broad range of metrology capabilities, high-resolution imaging and innovative design makes it an invaluable tool for making sure the quality and performance of wafers are met.