Used KLA / TENCOR P15 #293825144 for sale
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ID: 293825144
Wafer Size: 8"
Surface profiler, 8"
Semiconductor wafers
Thin-film heads
Precision-machined and polished surfaces
Ceramics for micro-electronics
Glass for flat panel displays
Optical surfaces
Measurement range: 100Å (0.4 min), 300µm (11 mils)
Vertical resolution: 0.5, 2 / 10Å
Operating system: Windows NT.
KLA / TENCOR P15 Wafer Testing and Metrology Equipment is a state-of-the-art, high-throughput metrology system designed to inspect semiconductor wafers. It is equipped with advanced optical metrology technologies, high-resolution imaging capabilities, and powerful computer processors that allow for extremely fast and accurate metrology results. The unit is used to perform a variety of wafer tests and analyses on both unprocessed and processed wafers. These tests include defect inspection, stress analysis, device characterization, yield management, and critical dimension measurements. KLA P-15 machine utilizes 650-nm laser reflected light measurements with a resolution of 5 nm to detect and analyze defects. By capturing and analyzing images of the wafers, TENCOR P 15 tool can identify and measure defects and characteristics such as line width, as well as anomalies. KLA / TENCOR P 15's high-speed optical and imaging systems are capable of delivering results up to 25,000 wafer measurements per hour, allowing for rapid inspection of large quantities of wafers. The asset's fast-capture capabilities, combined with powerful analytics and data analysis algorithms, enable it to quickly assess critical parameters such as device performance and reliability. KLA P 15 model also incorporates an array of sophisticated automation tools, enabling customers to easily customize operations and optimize throughput. Traditionally difficult and time-consuming inspection processes can now be completed automatically to maximize production efficiency. TENCOR P-15 Wafer Testing and Metrology Equipment is designed for semiconductor industries and processional research labs requiring high-precision, high-accuracy, and fast metrology performance. Its sophisticated and automated capabilities, combined with its high resolution imaging capabilities, make it an ideal choice for advanced metrology processes.
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