Used KLA / TENCOR P17 #293664880 for sale
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ID: 293664880
Surface profiler
Constant stylus force controller
Microhead 5 SR Measurement head
Vertical range: 0-327 µm
Stylus force: 0.5-50 mg
Scan length: 200 mm
Dual-view optics: Side and top view
Top view objective lens: 1400 x 1040 µm
With auto magnification
Digital camera: 5 Megapixel
Stylus radius: 2.0 µm, 60°
Motorized level and rotation, 8"
Hold-down vacuum sample
PC With LCD Monitor, 23"
Operating system: Windows.
KLA / TENCOR P17 is a wafer testing and metrology equipment designed to measure defects, device properties, composition, and other features of semiconductor wafers used in modern device fabrication. It can analyze a variety of material layers in a single scan, allowing quick detection of process variation and defects. The system contains wafer scanning optics, automated microscopes, and a wide range of optoelectronic and electromagnetic sensors. The optics is comprised of lasers, lens systems, and other optical elements that are used to capture a wide variety of measurements at multiple angles and depths on each single scan. The automated microscopes include a motorized, z-axis stage and a high resolution camera to capture high-resolution images of the wafer. KLA P-17 is capable of capturing critical information from each scan to identify detailed features and pattern structures of the wafer, provide detailed images showing local variations, and options for high-resolution analysis of both critical thickness and composition variations. By combining both area and point measurements, it provides an overview of what is happening on the wafer. TENCOR P 17's advanced algorithms can detect problems earlier on in the process, providing engineers with an opportunity for fast corrective action. The unit can detect and measure various types of defects and degradation, such as oxide build-up, contamination or corrosion, and can also be used to measure indicators of wire integrity. In addition, TENCOR P-17 can collect data across all of the material layers of a wafer, providing complete information on defects and process variation for comprehensive analysis. The machine also includes an integrated database that allows for efficient storage and analysis of large amounts of inspection data. To ensure accuracy and reliability, KLA P 17 can be repeatedly calibrated with the help of built-in NIST traceable calibration standards. The tool is a fully automated asset, and can be integrated into a wide range of production processes, reducing testing time and costs, and providing highly accurate, repeatable results. In conclusion, TENCOR P17 is an advanced wafer testing and metrology model that can detect various types of defects or degradation on silicon wafers. Its advanced sensors and optical systems provide engineers with comprehensive information for rapid corrective action and improved efficiency. The equipment can be integrated into production processes, reducing testing time and costs, and providing reliable results.
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