Used KLA / TENCOR P2 #9183261 for sale
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ID: 9183261
Wafer Size: 6"
Vintage: 1992
Surface profiler, 6"
Step height: 500 Å to 80 µm
Scan length: 0.01 mm to 160 mm
Stylus radius: 12.5 µm
1992 vintage.
KLA / TENCOR P2 is a wafer testing and metrology equipment designed to measure, identify, and track the physical properties of semiconductor wafers used in the fabrication of integrated circuits. The system combines advanced optical, power, and x-ray technologies to provide sub-micron probing and metrology capabilities. KLA P-2 unit consists of an optical wafer inspection module, a power metrology station, an x-ray diffraction station, and an imaging station. The optical machine uses laser and brightfield inspection technologies to measure the features of wafers. This technology is able to detect miniscule flaws such as pits, cracks, particles, and geometry discrepancies. It is also able to identify very small features in the wafer, such as line width and line-space dimension variations. The power metrology station uses automatic testing and contact scanning to measure power dissipation in the device. This is important in ensuring that the device functions as designed and that the chips do not overheat. The x-ray diffraction station analyses the material properties of the wafer in order to measure changes in the crystal lattice and strain within the individual wafers. The imaging station effectively captures the top-down surface images of the wafer and uses the image to measure different parameters such as contrast, clarity, focus, resolution and more. These images are used to accurately identify defects and to ensure that the device is up to specification. TENCOR P 2 tool also uses a data analysis suite to store, organize, and compare the inspection results from each wafer. KLA P 2 asset offers a complete set of metrology and defect inspection capabilities for semiconductor wafers. It helps provide manufacturers insight into the quality of their wafers and products and helps to ensure that the wafers and chips meet their desired specifications.
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