Used KLA / TENCOR P2H #9241190 for sale

KLA / TENCOR P2H is a leading-edge wafer testing and metrology equipment designed for automatic, non-destructive defect inspection and thickness analysis of various silicon integrated circuit (IC) wafers. This advanced system for wafer testing and metrology utilizes the latest technologies in both hardware and software. KLA P-2H can automatically inspect and analyze wafer surface defects with high precision, including those caused by contaminants, particulates such as dust, and processing-based patterns. Its built-in 3D optical inspection technology is capable of quickly and accurately detecting and mapping defect patterns on the wafer surface, with less than a 6-micron resolution. The unit also uses hi-res spectral imaging and fluorescence measurements to identify and measure contamination on the wafer surface. In addition to defect inspection, TENCOR P 2H is capable of measuring wafer thickness and other topographical features, such as channel depths, pattern pitch, peak heights, and others. It includes a patented technology called AVI (Achievement of Vertical Integration) which helps analyze wafer values quickly and accurately. The AVI toolkit can recognize a range of wafer patterns say up to 25 microns to achieve near-instant precise readings. With all these features, KLA P2H runs ultra-fast wafer surface testing and metrology with a remarkably small footprint of less than 1 square meter. KLA P 2H also features a powerful Linux-based software architecture. It has a sophisticated user interface for easy operation and provides full capture and analysis of test data. This sophisticated software-based platform allows for automated report generation with full traceability and archiving capabilities. This means a recorded audit trail of all analysis data generated by the machine can be exported for further review and traceability. KLA / TENCOR P 2 H is a leading-edge solution for wafer testing and metrology that advanced IC manufacturing processes. It provides high-precision, non-destructive inspections and uniformity analysis of wafers with a remarkably small footprint and an advanced software-based control platform for data archiving and traceability. With its primary purpose of improving wafer production yields, KLA / TENCOR P 2H is an essential tool for modern IC manufacturers.