Used KLA / TENCOR Puma2 #9270869 for sale

KLA / TENCOR Puma2 is an advanced metrology and wafer test equipment designed to improve the performance and accuracy of semiconductor wafer fabrication. The system allows for the introduction of ultra-high precision metrology throughout the wafer fabrication process. Equipped with an advanced set of optics and wafer inspection software, the unit can quickly and accurately measure wafer critical dimensions (CD) and die topographies. KLA Puma2 machine consists of a high-resolution imaging tool, a photomask metrology asset, and a variety of optical and software tools. The high-resolution imaging model provides measurement of precise nanometer level CD's, allowing for improved process control and yield. The equipment also allows for the determination of profile and surface topography of wafers. The photomask metrology system is a specialized tool used for optical inspection of photomask defects and other features in masks used in the wafer fabrication process. It provides a fast and accurate means of determining both standard and irregular defects present in the mask. The unit supports a wide range of wafer sizes and IC substrate geometries, including square, rectangular, circular and other shapes. A variety of specialized wafer handling stages are compatible with the machine, providing a wide range of sample movement capabilities. The tool also features its own software, which provides an intuitive user interface, comprehensive data management and analysis, and an integrated image analysis library. TENCOR Puma2 asset is a leading edge solution for process control and defect detection in the semiconductor industry. With its high performance imaging systems, photomask metrology capabilities, and intuitive user interface, the model provides a cost-effective way to improve yields and increase manufacturing speed. Excellent customer support and training options make it an ideal solution for small or large-scale wafer fabrication operations.