Used KLA / TENCOR RS Series #293597083 for sale

KLA / TENCOR RS Series
ID: 293597083
Resistivity mapping system.
KLA / TENCOR RS Series is a state-of-the-art wafer testing and metrology equipment, designed for efficient and accurate monitoring of microelectronics production and packaging. It is a fully automated system, allowing for rapid and reliable testing of wafer surfaces. KLA RS Series consists of three different models with distinct features and capabilities. The RS 300 model is designed for advanced, 3D process control with critical dimension scanning unit, or CD-SEM. It is capable of detecting surface defects and roughness with high accuracy and reproducibility, even on the smallest of circuit patterns. The RS 300 also includes an Optical Microscopy Module with color video capability to provide high-resolution images and measurements of film thickness, etch depth/profile, grain size and optical properties. The RS 500 model is intended for precision metrology of surfaces and thin films. It is equipped with a dielectric whitelight reflectometer, capable of analyzing and measuring dielectric properties of the wafer without the need for sample contact. This allows for more precise and consistent results over the entire wafer surface. The model also includes a Mass Spectrometer Module, enabling the analysis and quantification of gas contaminants and inert species. The most advanced model in TENCOR RS Series is the RS 1000, built for high-performance, mapping-level measurements and monitoring in production environments. This model includes an integrated transmissive Transmission Electron Microscopy (TEM) machine for direct observation of nanostructures and features. The tool also features an interferometer-based "noncontact" 3-D surface measurement asset, enabling low noise and residual phase measurements with greater accuracy and precision than ever before. In conclusion, RS Series is the perfect solution for advanced wafer testing and metrology. It can provide accurate measurements of surface properties and nanopatterns, enables monitoring of contamination levels, and provides incomparable data analysis capabilities. Its automated model ensures quick and efficient results, allowing for increased productivity and improved quality control in the manufacture of microelectronics.
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