Used KLA / TENCOR SpectraMap SM300 #293642275 for sale

KLA / TENCOR SpectraMap SM300 is a wafer testing and metrology equipment designedfor inspecting and measuring the structures on semiconductor wafers. It uses advanced optical, electrical and laser technologies to detect defects in the structures while they are still in the wafer fabrication stage, allowing for timely and efficient rectification of any detected issue. KLA SpectraMap SM300 consists of a number of subsystems, each designed for a particular wafer-testing or metrology function. On of these systems is the Acton SpectraPro UV-VIS spectrophotometer. This device uses advanced ultraviolet-visible (UV-VIS) spectroscopy to measure the thickness and refractive index of the structures on semiconductor wafers. By using this method, potential faults can be identified as the production process is carried out. It is also capable of evaluating the uniformity of deposition for a wide range of wafer materials, including metals, silicides, dielectrics, and semiconductors. The spectrophotometer is also highly sensitive to surface roughness and contamination. The system also includes the Dynamite LaserTune laser-interferometer. This is employed during wafer processing, to analyze the motion of machine components which facilitates rapid process control. LaserTune's Interferometer-based motion control technology provides very high precision control of surface topography and scratch-depth profiling, particle inspection, semiconformity testing, and other metrology applications. The laser-interferometer works in tandem with the SpectraPro UV-VIS spectrophotometer to ensure high-accuracy results. The Vertical Automated Wafer Inspection (VAWI) unit is also included in TENCOR SPECTRAMAP SM 300. This is used to scan wafers during the production process, in order to detect various physical defects, such as non-uniformity of surfaces, contaminations, and particle deposits. It also uses advanced leakage current and resistivity measurement technologies to determine the integrity of devices. The VAWI machine is supported by the highly programmable Layout Control Tool (LCS), which provides real-time process control and dynamic quality control. These complex systems make up KLA / TENCOR SPECTRAMAP SM 300 wafer testing and metrology asset, allowing efficient and reliable quality control for wafer manufacturing processes. The model is designed to improve process efficiencies, reduce downtime and scrap, as well as provide real-time detection of potential process errors.