Used KLA / TENCOR UV 1050 #293619569 for sale

ID: 293619569
Film thickness measurement system.
KLA / TENCOR UV 1050 is a wafer testing and metrology equipment designed for advanced semiconductor fabrication. It is a fully automated, high throughput inspection and metrology system that provides real-time data on each wafer. KLA UV 1050 is capable of measuring nanometer-scale features with precision and accuracy. The unit functions by using a series of laser and vision techniques. These include laser scatterometry, laser interferometry, white light interferometry, image-based inspection and metrology, and fluorescence metrology. For example, laser scatterometry measures the scattering of laser light off of a wafer surface, allowing for geometric measurements of nanometer-scale features. Laser interferometry images the micro-textures of the wafer surface to capture three-dimensional topography. White light interferometry measures films, films on films, and topography on films with nanometer-scale resolution. Image-based inspection measures the presence, size, and shape of defects. Finally, fluorescence metrology measures the light emitted from the wafer's surface to detect critical components and defects. TENCOR UV 1050 is designed to enable manufacturers to more easily detect critical defects and control process parameters in high-volume wafer manufacturing. Its powerful optics allows for multiple device images and automatic scans of entire wafers. The high-speed imaging machine captures four images per second, providing quick and accurate results. The tool's image-based metrology capabilities are capable of accurately measuring numerous surface features, including TCDs, film resistances, topographies, thickness measurements, and cross-sectional profiles. Additionally, UV 1050 features proprietary brightfield, darkfield, and fluorescence clutter reduction technologies, providing users with dynamic defect enhancement and deeper inspection. Overall, KLA / TENCOR UV 1050 provides a reliable and easy-to-use wafer testing and metrology asset, making it a valuable asset to advanced semiconductor facilities. By combining cutting-edge imaging technology with automated and high-speed inspections, KLA UV 1050 provides manufacturers with the ability to accurately measure, identify, and control critical defects on a nanometer-scale.
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