Used MITUTOYO SJ-301 #9287963 for sale

MITUTOYO SJ-301 is a high-accuracy wafer testing and metrology equipment specifically designed for advanced failure analysis, process monitoring and device development in research and development, manufacturing, and quality control applications. The system utilizes an optical metrology technique which combines precise measurements of the wafer's structure with a precise measurement of the surface profile of the wafer. The unit is composed of four main components: the optical head unit (which houses the optical elements and laser source for light guide and imaging); the stage for wafer handling (including the sample platform and CCD camera for monitoring position and substrate orientation); the metrology console for data acquisition and analysis (equipped with image processing software); and the precision stage controller. The optical head unit of SJ-301 contains a high-power laser diode module for guiding the light beam which is split into two, the working and reference beams. Both beams are imaged through an array of fiber optics onto the sample surface and the sample is placed at the focal plane of a 4x Objectives lens. The resulting image is collected and analyzed by the camera, CCD array, and Objectives lens on the metrology console where it is processed into a profile map of the scanned area. The metrology console of the machine consists of a computer-based data acquisition tool, a graphical user interface and image processing software. The software can be used to enhance the signals collected by measures such as signal-to-noise ratio improvement. The data is then transferred into a database containing all the associated measurements by the precision stage controller. The precision stage controller of MITUTOYO SJ-301 is a programmable precision scanning controller that is designed to provide a continuous range of motion to the sample platform. The controller allows for precise wafer positioning and enables the user to adjust the position of the sample relative to the optical head unit to account for the precise measurements from the asset. SJ-301 provides precise measurements of wafer surface topography for advanced failure analysis and device fabrication processes. The model is equipped with a high-accuracy imaging and analysis unit, precision stage controller, and an intuitive graphical user interface which makes it simple and easy to operate. With its versatile capabilities, this equipment is a powerful tool for semiconductor and wafer metrology applications.